Polyvinyl Cinnamate Negative Photoresist
Products
Online Inquiry

Polyvinyl Cinnamate Negative Photoresist

Polyvinyl Cinnamate Negative Photoresist

Cat No:SBMPM-0001

Description

Suitable for microfabrication of integrated circuits. Delivers clear patterns after exposure and development, with strong adhesion to silica and aluminum oxide.

Basic Information

Material Type Negative Photoresist
Sensitive Wavelength (nm) 250-365
Curing Mechanism UV-induced Polymerization
Curing Time (s) 30-120
Transmittance (%) 85-90
Haze (%) 1.2-1.8
Refractive Index 1.50-1.52
Tensile Strength (MPa) 45-55
Hardness (Shore D) 80-85
Heat Distortion Temp (℃) 80-100
Solvent Resistance Excellent (Resists HF, H3PO4)
Form Factor & Dimensions Liquid: 1L/5L Containers; Film: 0.4-0.6μm
Solid Content (%) 9-10
Yellow Index (YI) 1.8-2.5
Adhesion Grade 1 (ISO 2409)

GET IT!

CD BioSustainable-Advanced Materials is a distinguished company specializing in advanced materials. We provide advanced technical services and comprehensive solutions to ensure that our clients get the most satisfactory results.

Contact Us

Our products and services are for research use only and cannot be used for any clinical purposes.

0
0

There is no product in your cart.